摘要
本文阐述了离轴照明提高曝光分辨率和增加焦深的原理，应用Ｈｏｐｋｉｎｓ理论研究了其成像特性。给出了两种离轴照明方式──四极照明和环形照明下的空间像分布，并和传统照明方式下的空间像分布作比较。计算结果说明，采用离轴照明使得曝光分辨率和焦深得到了很大的提高。
The principle of Off-axis illumination for improving photolithographic resolution and increasing depth of focus is presented. Hopkings imaging theory isused to calculate intensity distribution of space image,and some results of twoillumination types,quadrupole and annular illuminations are given. The calculation results show that the resolution is improved and the DOF is increased on thecondition of off-axis illumination, compared with conventional illumination.
出处
《微细加工技术》
1996年第2期12-18,共7页
Microfabrication Technology
关键词
曝光
离轴照明
分辨率
焦深
微细加工
photolithography
off-axis illumintion
resolution
depth of focus
