电沉积铁镍纳米合金薄膜的结构和性能研究

Investigation on the microstructure and properties of electrodeposited iron-nickel alloy film with nano-structure

采用电沉积方法从硫酸盐体系镀液中沉积得到Fe18 Ni82合金薄膜。运用扫描电子显微镜（SEM），原子力显微镜（AFM），透射电子显微镜（TEM）和X射线衍射分析（XRD）以及磁测量设备分别对薄膜的表面形貌、显微结构和磁性能进行表征和测量。同时利用万能材料试验机和显微硬度计测量了薄膜的力学性能。结果表明：电沉积制备的Fe18 Ni82合金薄膜成分均匀，表面平整、光亮、致密，晶粒大小为40-50nm。薄膜是以Ni为溶剂原子，Fe为溶质原子的置换型固溶体，只存在单一的fcc相，Fe18 Ni82合金薄膜沿（111）面有较强的择优取向。镀态Fe18 Ni82合金薄膜在50Hz交流磁场下，测得其饱和磁感应强度为1．08T，最低矫顽力为20A／m。19μm厚的纳米晶薄膜的断裂应力达到785MPa，显微硬度达到605Hv。

Fe-Ni alloy film were prepared from sulphate solution by electroplating. The surface morphology,micro-structure and magnetic properties of the thin film were examined by using SEM,AFM,TEM,XRD and magnetic measurement equipment,respectively. Mechanical properties of the film were measured by omnipotence material test machine and sclerometer. The experimental results show that the surface of the as-deposted film is bright,compact and smooth. The film is composed of transpositional solid solution with Ni as solvent and Fe as sulute,and the grain size of the film is about 40-50nm. The as-deposited Fe18 Ni82 film have strongly priority tropism in （111） side. The minimum coercive force of the as-deposted film is 20A/m, the saturated flux density reaches 1.08T. The rupture stress of the as-deposited film reaches 785MPa and hardness of the film is Hv605.