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水溶性光致抗蚀剂研究进展 被引量：2

Research Development on Water-Soluble Photoresist
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摘要 本文按传统光化学反应型和化学增幅型两种类型对近10年水溶性光致抗蚀剂的发展状况做了分类总结,并重点介绍了成像反应原理和各体系的优缺点. Studies on water-soluble photoresists during the last decade have been summarized in two parts： traditional photochemical reaction type and chemically amplified type. The chemical mechanisrn and the characteristics of the lithographic systems were mainly introduced.
作者 翟晓晓 褚战星 王力元
机构地区 北京师范大学化学学院
出处 《感光科学与光化学》 EI CSCD 2007年第1期69-79,共11页 Photographic Science and Photochemistry
关键词 水溶性光致抗蚀剂 化学增幅 正型 负型 water-soluble photoresist chemically amplified positive tone negative tone
分类号 TN304.9 [电子电信—物理电子学]
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  • 1Freehet J M J, Ito H, Willison C G. Sensitive deep UV resist incorporating chemical amplification[J].Proc. Microcircuit Eng., 1982,82:260.
  • 2MacDonald S A, Willison C G, Frechet J M J.Chemaical amplification in high-resolution imaging systems[J]. Acc.Chem. Res., 1994,27(6) : 151-158.
  • 3Lin Q H, Simpson L, Steinhausler T, et al. Water-soluble resist for "Environmentally Friendly" lithography[C]. In:Proc . SPIE , Metrology ,Inspect ion , and Process Control for Microlithography X, 1996,2725:308-319.
  • 4Lin Q H, Steinhausler T, Simpson L. A water-tastable, water-developable chenaically amplified negative-tone resist[J]. Chem. Mater,, 1997,9:1725-1730.
  • 5Harvard J M, Vladimirov N, Frechet J M J. Photoresists with reduced environmental impact: water-soluble resists based on photo-cross-linking of a sugar-containing polymethacrylate[J]. Macromolecules, 1999,32:86-94.
  • 6Harvard J M, Shim S Y, Frechet J M J. Desisn of photoresists with reduced environmental impact. 1. water-soluble resists based on photo-cross-linking of poly(vinyl alcohol) [J]. Chem. Mater., 1999,11 : 719-725.
  • 7Shirai M, Katsuta N, Tsunooka M. Photosensitive polymers bearing iminooxysulfonyl groups. A water soluble positive-type photoresist[J ]. Makromol. Chem., 1989,190(9):2099-2107.
  • 8Guo Y Z, Fei F, Miyashita T. An environmentally friendly water-developable positive photoresist using LB films fabricated from methacrylamlde copolymers[J]. Bull. Chem. Soc, Jim. ,1999,72:2149-2153.
  • 9Ichimura K. Preparation of water-soluble photoresist derived from poly (vinyl alcohol) [ J ]. J. Polym. Sci., Polym.Chem., 1982,20(6):1411-1417.
  • 10Shirai M, Ma W G, Tsunooka M. Photoerosslinking of poly(N-phenylmathacrylamlde) and its homologues[J].Polym. J., 1993,29(7) :913-918.

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感光科学与光化学
2007年 第1期

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