摘要
The post-growth treatment of a [100]-oriented diamond film was performed to improve the film quality. The characteristic of post-growth film was investigated by using the RAMAN spectrum and the capacitance-frequency curve. The results show that the resistivities and frequency response enhance after the post-treatments in solution of H2SO4 and H2O2 and an annealing under N2 atmosphere at 500 ℃ for 60 min. Under a bias voltage of 100 V, the net photocurrent is obtained under 55Fe(5.9 keV) X-rays and 241Am (5.5 MeV) α particles radiation, respectively. The photocurrent increases rapidly at first and becomes stable for the “pumping” effect with the radiation time.
The post-growth treatment of a [ 100]-oriented diamond film was performed to improve the film quality. The characteristic of post-growth film was investigated by using the RAMAN spectrum and the capacitance-frequency curve. The results show that the resistivities and frequency response enhance after the post-treatments in solution of H2SO4 and H2O2 and an annealing under N2 atmosphere at 500℃ for 60 min. Under a bias voltage of 100 V, the net photocurrent is obtained under ^55Fe（5.9 keV） X-rays and ^241Am （5.5 MeV） α particles radiation, respectively. The photocurrent increases rapidly at first and becomes stable for the ＂pumping＂ effect with the radiation time.
出处
《中国有色金属学会会刊：英文版》
CSCD
2006年第B01期317-320,共4页
Transactions of Nonferrous Metals Society of China
基金
Project(60577040) supported by the National Natural Science Foundation of China
Project (0404) supported by Shanghai Foundation of Applied Materials Research and Development
Projects(0452nm051, 05nm05046) supported by the Nano-technology Project of Shanghai
Project(T0101) supported by Shanghai Leading Academic Disciplines
关键词
金刚石膜
HFCVD法
退火效应
辐射性质
diamond film
hot filament chemical vapor deposition（HFCVD）
annealing
radiation
