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等离子化学气相沉积硬膜技术研究

Hard Coatings Prepared by PCVD
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摘要 用等离子体化学气相沉积(PCVD)技术制备了TIN、TiC、Ti(CN)和(TiSi)N膜及其组合的多层膜。PCVD具有很好的覆盖性,PCVD-TiN具有很好的耐磨、蚀性,膜与基体结合良好,因而用PCVD法在高速钢刀具、模具及轴承上沉积TiN可大大提高其使用寿命。PCVD-TiN和Ti(CN)膜无明显柱状晶,其显微硬度高于TiN亦可用于高速钢刀具、模具上提高其使用寿命。PCVD-(TiSi)N,晶粒细化,氯含量和显微硬度随Si含量而变化,(TiSi)N具有很好的抗高温氧化性。多层膜可调节膜层结构,减少残余应力,提高膜的机械性能。 TiN, TiC, Ti(CN),(TiSi) N hard coatings and their multicomponent mixed layerswere prepaied by PCVD. PCVD-TiN coatings exhibited good wear-resistace, corrosion-resistance andgood adhesion, so PCVD-TiN catings on the tools, moulds and bearings with HSS could greatlyincrease their working life. Unlike coventional PVCD-TiN, no columnar growh were noticeable inPVCD-TIC and Ti (CN) coatings, whose microhardness was higher than TiN coatings and which couldalso be used in HSS tools and increase the working life of tools. The fine-grained structures could begot in PVCD- (TiSi) N in which the Cl content and microhardriess were changed with Si content.(TiSi) N codings were good antiokidant. Multilnyers could modulate the layed structures, reduce theresidual streases and incrare the mechanical properties of the coatings.
出处 《青岛化工学院学报(自然科学版)》 1996年第4期373-378,共6页 Journal of Qingdao Institute of Chemical Technology(Natural Science Edition)
关键词 等离子体 化学气相沉积 镀膜 PVCD,hard coatings,multilayer
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  • 1李世直,徐翔.等离子体化学气相沉积TiN膜的研究[J]金属学报,1988(03).
  • 2韩效溪,丁正明,林行方.离子镀氮化钛膜层综合剖析[J]上海交通大学学报,1988(01).
  • 3Shizhi Li,Wu Huang,Hongshun Yang,Zhongshu Wang. Plasma chemical vapor deposition of TiN[J] 1984,Plasma Chemistry and Plasma Processing(3):147~161

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