摘要
The Cl2-sensitive heteropolysiloxanes(HPS) film was formed on the interdigital capacitor based on silicon dioxide by means of sol-gel process and spin-on technique.Measurements of interdigital capacitance were performed at room temperature for frequencies 100 Hz,1 kHz and 10 kHz.It is shown that there is a linear relationship between the capacitance and the concentration of chlorine gas.Influences of the measurement frequency and film thickness of silicate on the sensitivity of the sensor to C12 gas were discussed.And organically modified N,N-diethylaminopropyl-trimethoxysilane (APMS) had a much higher sensitivity.
The Cl2-sensitive heteropolysiloxanes（HPS） film was formed on the interdigital capacitor based on silicon dioxide by means of sol-gel process and spin-on technique. Measurements of interdigital capacitance were performed at room temperature for frequencies 100 Hz, 1 kHz and 10 kHz. It is shown that there is a linear relationship between the capacitance and the concentration of chlorine gas. Influences of the measurement frequency and film thickness of silicate on the sensitivity of the sensor to C12 gas were discussed. And organically modified N,N-diethylaminopropyl-trimethoxysilane （APMS） had a much higher sensitivity.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2006年第A03期152-154,共3页
Rare Metal Materials and Engineering
