期刊文献+

同步辐射X射线双晶单色器联动机构 被引量:2

A mechanical linkage of double crystal X-ray monochromator for synchrotron radiation
下载PDF
导出
摘要 提出了一种实现固定空间输出位置同步辐射双晶单色器的方法及联动机构。分析了基于Bragg衍射原理的此类X射线双晶单色器发展状况,尤其是在能量扫描过程中,通过运动补偿实现出射光束方向与位置固定的方法,总结了各种机械联动机构。在综合凸轮耦合运动机构及直角联动机构运动特点基础上,详细描述了国家同步辐射实验室成功研制的X射线双晶单色器L型联动机构特征,其融合了二者的优点,简化了结构与运动,重点分析了其结构原理与运动关系,以及机构运动的实现与第二晶体自身微调,并对其性能做了进一步的讨论。测试结果表明,L型联动机构完全适用于实现3.1-12.4 keV整个能量范围的全谱扫描实验研究。 A novel mechanism for the fixed-exit double crystal monochromator of Bragg-Bragg diffraction case used widely in synchrotron radiation was presented. The development of double crystal monochromator for synchrotron radiation X-ray was reviewed briefly, especially of the fixed-exit mode. Several kinds of implementation approaches for the energy scanning of the photons were summarized by analyzing the common mechanical linkage schemes. Based on the principle of mechanism with rotation plate coupling motions on fixed cams as well as right-angle linkage device, the L-shaped mechanical linkage used in successfully the double crystal monochromator of X ray beamlines at National Synchrotron Radiation Laboratory (NSRL) was introduced in detail. It adopted the advantages of the config design mecha meeha above right angle and motion coupling mechanism to operate the mechanical linkage in simple urations and motions. Motion mechanism and position adjustment of the crystals, mechanical of the related structure, and the incoming improvement were discussed,It is indicated that the nical linkage is suit for the experimental researches at 3.1-12.4 keV by off-line testing of the nism and on line measurement of the monochromators.
出处 《光学精密工程》 EI CAS CSCD 北大核心 2007年第2期224-229,共6页 Optics and Precision Engineering
基金 国家自然科学基金(No.10575098)
关键词 联动机构 运动分析 双晶单色器 X射线 同步辐射 mechanical linkage motion analysis double crystal monochromator X-ray synchrotron radiation
  • 相关文献

参考文献23

  • 1HART M, RODRIGUES A R D, Harmonics-free single-crystal monochromators for neutrons and X-rays [J], J, Appl. Cryst. , 1978,11(4):248-253.
  • 2HRDY J, Fixed-exit channel-cut crystal X-ray monochromators for synchrotron radiation [J], Czech, J, Phys., 1989,39(3):261-265.
  • 3HRDY J. Harmonic-free and fixed-exit monolithic X-ray monochromator [J], Czech. J, Phys. ,1990,40(4):361-366.
  • 4SPIEKER P, ANDO M, KAMIYA N. A monolithic X-ray monochromator with fixed-exit beam position [J]. Nucl. Instr. Met., 1984, 222(1-2):196-201.
  • 5KAWATA H, ANDO M. A double crystal monochromator for the photon factory wiggler beamline [J]. Nucl. Instr. Meth, 1986,246(1-3):368-372.
  • 6LEMONNIER M, COLLET O, DEPAUTEX C, et al., High vacuum two crystal two crystal soft X-ray monochromator [J], Nucl, Instr. Meth. , 1978,152(1):109-111.
  • 7GOLOVCHENKO J A, LEVESQUE R A, COWAN P L, X-ray monochromator system for use with synchrotron radiation sources [J]. Rev. Sci. Instrum., 1981,52(4):509-516.
  • 8COWAN P L, HASTINGS J B, JACH T, et al., A UHV compatible two-crystal monoehromator for synchrotron radiation [J]. Nucl. Instr. Meth. , 1983,208(1-3):349-353.
  • 9KIRKLAND J P. A UHV-compatible fixed two/four crystal monochromator [J]. Nucl. Instr. Meth. A, 1990,291 (1-2):185-191.
  • 10MASON W P, EMMEL G R, FEYZI F, et al.. A new double-crystal monoehromator for UHV operation in the low to medium photon energy range [J]. Rev. Sci. Instrum. , 1996,67(9):3350-3351.

二级参考文献51

  • 1程曙初.同步辐射超光滑X光学元件的加工工艺及检测技术的研究[J].光学精密工程,1994,2(4):69-78. 被引量:1
  • 2吴一辉,王立鼎,马建旭.新型微变位致动器的发展及应用[J].光学精密工程,1996,4(2):7-13. 被引量:7
  • 3Xu Chaoyin,Nucl Instr Method.A,1998年,410卷,293页
  • 4徐朝银.X射线衍射和散射光束线的环面聚焦镜设计[J].中国科学技术大学学报,2000,30:162-168.
  • 5JEAN S. Design parameters for hard X-ray mirrors: the European synchrotron radiation facility case[J]. Optical Engineering, 1995, 34(2): 361-375.
  • 6CHETWYND D G. Linear translation mechanisms for nanotechnology applications[J]. Measurement & Control,1991,24:51-55.
  • 7ISHIKAWA Y, KITAHARA T.Present and future of micromechatronics[C].IEEE International Symposium on Micromechatronics and Human Science.Nagoya,Japan.1997:13-20.
  • 8MARUO S, IKUTA K.New microstereolithography(super-IH process) to create D freely movable micromechanism without sacrificial layer technique[C].IEEE International Symposium on Micromechatronics and Human Science,Nagoya,Japan.1998:115-120.
  • 9AKITA S.Micromachine technology development and its applications[C].IEEE International Symposium on Micromechatronics and Human Science.Nagoya,J.1998:17-22.
  • 10Montané E, Miribel P, Puig-Vidal M,et al.High voltage smart power circuits to drive piezoceramic actuators for micro robotic applications[C].Proceedings of DCIS 2000. Montpellier, 2000:668-673.

共引文献110

同被引文献17

  • 1孙潇,贾书海,朱军,李以贵.新型MEMS微针设计及其力学性能[J].Journal of Semiconductors,2007,28(1):113-116. 被引量:7
  • 2贾书海,李以贵,朱军,孙潇.一种新的低成本微电子机械系统微针加工方法[J].西安交通大学学报,2007,41(5):589-592. 被引量:3
  • 3明平美,朱荻,胡洋洋,曾永彬.UV-LIGA技术制备微型柔性镍接触探针[J].光学精密工程,2007,15(5):735-740. 被引量:13
  • 4BECKER E, EHRFELD W, HAGMANN P, et al.. Fabrication of microstructures with high aspect ratios by LIGA process [J]. Microelectron. Eng. , 1986:35-56.
  • 5BLEY P. The LIGA process for fabrication of 3D micro-scale structures [J]. Interdisc. Sci. Rev. , 1993,18(4) :267-272.
  • 6FU L, MIAOJ M, LI X X, et al.. Study of silicon for deep etching micro-gyroscope fabrication [J]. Appl. Surface Sci. , 2001,177(1-2):78-84.
  • 7CHABLOZ M, SAKAI Y, MATSUURA T, et al.. Improvement of sidewall roughness in deep silicon etching [J]. Microsyst. Technol. , 2000,6 (3) : 86- 89.
  • 8GREGORY P B, MICHAEL T D. Excimer laser micromachining for rapid fabrication of diffractive optical elements [J]. Applied Optics, 1997, 36 (20) :4666-4674.
  • 9SUSUMU S, SOMMAWAN K, GAKU K. Plane- pattern to cross-section transfer (PCT) technique for deep x-ray lithography and applications [J]. J. Micromec. Microeng, 2004,10 : 1394-1404.
  • 10KIM K, PARK D S, LU H M. A tapered hollow metallic microneedle array using backside exposure of SU-8[J]. J. Micromech. Microeng, 2004,14 (2) :597-603.

引证文献2

二级引证文献6

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部