样品室真空度对磁控溅射Ti膜结构的影响

Effect of chamber vacuum on microstructure of magnetron sputtering Ti film

本文利用场发射扫描电子显微镜和能谱仪研究不同样品室真空度条件下磁控溅射Ti沉积膜膜层的氧含量和微观结构。结果发现,当样品室真空度较低时,膜层的氧含量很高,膜层为钛的氧化物;随着真空度的提高,膜层的氧含量降低,Ti的晶粒出现;进一步提高真空度,Ti晶粒更为明显,膜层的截面呈柱状晶结构。

The oxygen content and microstructure of Ti films deposited by DC magnetron sputtering were studied by FE-SEM and EDS. The result showed that the oxygen content was high at low chamber vacuum and all the film was oxide. The oxygen content decreased obviously when the vacuum was increased. The facet grains appeared on the film surface and the columnar structure was seen at cross-section of the film.