摘要
LaB6阴极凭借其优良的发射特性已广泛应用于各种大电流密度的电子源,但是硼化镧薄膜的制备方法以及其发射特性还未得到深入的研究,本文对在Ta金属基底材料上使用电子束蒸发法得到的硼化镧薄膜表面型貌使用扫描电子显微镜进行了观测,使用XPS紫外光电子能谱仪测量了其原子比,薄膜显示出良好的发射特性,利用热发射测量逸出功,利用Richardson直线法计算得到薄膜材料的逸出功为2.64 eV。
Lanthanum hexaboride （LAB6） has been widely used for all kinds of large density electron source as it has unique emission characteristics, but the preparation of LaBx thin films has not deeply studied. In this paper LaBx films were prepared by electron beam evaporation method on a Ta ribbon, their surface morphologies were observed by SEM, and the atomic compositions of the films were measured by XPS. The films show excellent emission characteristics, the work function of the films was measured by thermal emission, which is obtained to be 2.64 eV by Richardson line method.
出处
《真空电子技术》
2006年第6期31-34,共4页
Vacuum Electronics
