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低压氩气氛火花放电等离子体中铜的时间分辨发射光谱及其激发机理(英文)

Time-resolved spectrum of copper emitted from reduced-pressure argon spark discharge plasma and the excitation mechanism
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摘要 抽真空充氩激发条件下,测定了Cu元素的单次火花脉冲放电时的几种原子线和离子线的放电强度随着氩气气氛压力变化的情况。它的原子谱线和离子谱线的放电信号随时间变化的峰形有很大差异。原子共振线CuⅠ324.75 nm的峰宽要大于离子线CuⅡ213.60 nm的峰宽。对于CuⅠ324.75 nm谱线,其单次放电寿命几乎与氩气压力无关,在随时间变化的峰形中包含一个初始峰和一个较大的后端拖尾峰,在氩气压力增大时拖尾峰更加明显。对于CuⅡ213.60 nm谱线,其单次放电寿命在不同氩气压力条件下有一定变化,在随时间变化的峰形中包含一个初始峰和一个小的后端拖尾峰。在每一次火花脉冲放电中,激发机理是随时间变化而变化的,因此上述现象就可以从它们的激发机理的不同得以解释。 Variations in the emission intensity of several atomic and ionic copper lines were measured during each shot of the argon spark discharges when the pressure of argon was varied at evacuated atmospheres. The time profiles were quite different between the atomic and the ionic lines, and also depended on the pressure of argon. The profile width of the atomic resonance line, Cu Ⅰ 324.75 nm, was broader than that of an ionic line, Cu Ⅱ 213.60 nm. In the case of Cu Ⅰ 324.75 nm, the overall lifetime of the signal was almost constant independent of the argon pressures, and the profile comprised an initial peak and a subsequent large tail which was more predominant at larger pressures of argon. In the case of Cu II 213.60 nm, the overall lifetime of the signal was a little varied at different argon pressures, and the profile comprised an initial peak and a subsequent small tail. These effects could be explained from the difference in their excitation mechanisms, which was changed temporally within a single spark shot.
出处 《冶金分析》 CAS CSCD 北大核心 2007年第1期24-28,共5页 Metallurgical Analysis
关键词 减压氩气气氛火花放电等离子体 原子发射光谱 时间分辨 激发机理 reduced-pressure argon spark discharge plasma atomic emission spectrometry time- resolved copper excitation mechanism
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参考文献3

  • 1S. Nakamura and K. Wagatsuma, CAMP, Report of ISIJ Meeting[C], 2005,18 : 1694.
  • 2S. Nakamura and K. Wagatsuma, Testu-to-Hagane[J], 2006,92.
  • 3K. Wagatsuma and S. Nakamura, ISIJ Int., in submission.

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