摘要
通过正交法进行小槽试验和Hull Cell试验，研究了三价铬电镀工艺中的pH值、温度、搅拌、电流密度等工艺条件和参数对镀层的影响。在各不同镀液组成和工艺条件下，充分地分析了镀层的表观形貌，确定了最佳镀液组成和工艺参数：采用了主盐和导电盐均为硫酸盐的全硫酸盐体系的三价铬镀铬；当pH=2—3、Jk=15—45A／din^2、工作温度：25—45℃时，采取静镀的方法可以得到光亮、致密的合格镀层。
The effects of technological condition and parameter, such as pH value, temperature, stirring, current density and so on on coating were studied by little slot test and Hull Cell test. The study shows that in the sulfate system, when the pH is close to two or three, current density is between 15 -45A/dm^2 and the temperature is between 25 - 45 ℃, it can obtain qualified coatings.
出处
《表面技术》
EI
CAS
CSCD
2007年第1期62-64,共3页
Surface Technology
关键词
三价铬镀铬
工艺参数
铬镀层
电镀
Trivalent chromium
Parameter
Coating
Electrodeposition
