基于阳极氧化铝模板的金属纳米孔阵列膜制备

Fabrication of metal nanopore array on anodic aluminum oxide templates

以0.3 mol/L草酸为电解液,在40 V直流电压、0～5℃下采用二步阳极氧化法制备了纳米多孔阳极氧化铝模板。用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜。SEM分析结果表明:金属膜复制了阳极氧化铝模板形貌,具有纳米孔有序阵列结构;金属膜的孔径受控于溅射功率和时间,功率30 W下沉积10 min约为68 nm,32 W下10 min约为58 nm,32 W下15 min约为25 nm。

Nanoporous anodic aluminum oxide （AAO） templates were prepared by a two step anodizing procedure at 0-5 ℃ and 40 V in 0.3 mol/L oxalic acid electrolyte. Metal aluminum films were deposited on AAO templates by radio-frequency magnetron sputtering. SEM analysis shows that the microstructure of metal film is highly ordered with regularity consistent with that of AAO template. The pore diameter of metal nanopore array film is controlled by the sputtering power and time, and is 68 nm for 30 W/10 min, 58 nm for 32 W/10 min, 25 nm for 32 W/15 min.