摘要
本文根据螺线管线圈内部磁场的分布规律,以及磁场对等离子体内部电子的作用原理,设计了磁场辅助的等离子体增强化学气相沉积(PECVD)系统,并且研究了在PECVD系统中获得均匀磁场的方法。而后,以SiH4和N2为反应气体,在低气压下沉积了SiN薄膜。测量了SiN薄膜的沉积速率,折射率,表面形貌等参数。验证了磁场分布的均匀性,分析了磁场在等离子体增强化学气相沉积系统中的作用。
Magnetic-field-aided PECVD（Plasma Enhanced Chemical Vapor Deposition） system was designed according to the magnetic field distribution in solenoid and the effect of magnetic field on the electrons in plasma. Investigates the way to obtain homogeneous magnetic field in the system. With Sill4 and N2 used as gas reactants the SiN thin film is deposited under low pressure. The deposition rate and refractive index are measured and the Atomic Force Microscope （AFM） images of film surface morphology are obtained, and the homogeneity of magnetic field distribution is thus verified. Finally, the role of magnetic field played in the PECVD system is analyzed.
出处
《真空》
CAS
北大核心
2007年第1期26-28,共3页
Vacuum
关键词
PECVD
氮化硅
磁场
沉积速率
折射率
表面形貌
PECVD
silicon nitride
magnetic field
deposition rate
refractive index
surface morphology
