摘要
介绍了半导体工艺中光刻版的重要作用,特别针对在实际工艺中使用普通玻璃材质光刻版对产品造成的成品率波动问题。通过对大量实验中失效现象的分析总结,找出波动产生的原因,并且根据实际采集数据进一步验证。最后得出结论:由于使用普通玻璃光刻版,使该产品的对位一直处于临界状态;当在单台设备上作业时,由于不存在设备之间的匹配问题,因而没有发生大规模的良率波动问题;但是,当使用多台设备交叉作业时,就不可避免地发生了良率的波动。
Aiming at the problem of yield fluctuation as a result of using normal glass masks, analyses on. product failures are made to find out the cause, which is further validated by data collected from process experiment. It is concluded that the use of normal glass mask makes the alignment of the product in critical state; and the yield fluctuation is not significant in the case of single machine where no matching is needed between machines, and when cross operation between several machines is conducted, abnormal yield is observed.
出处
《微电子学》
CAS
CSCD
北大核心
2007年第1期9-12,15,共5页
Microelectronics
关键词
光刻
玻璃光刻版
失效
良率
Photolithography
Glass mask
Failure
Yield