摘要
基于紫外光固化的紫外纳米压印技术可在常温常压条件下实现纳米结构批量复制,具有高分辨率、高效率和低成本的优点。通过对紫外纳米压印原理和工艺的分析,制备了石英玻璃模板,实现了在商用紫外固化聚合物OG154上的紫外纳米压印,转移复制了具有100nm特征的5cm×5cm面积的纳米结构图形。同时,介绍了如何利用传统紫外光刻机的套刻对准系统进行紫外纳米压印和套刻对准的方法。
UV-based nano imprint lithography is performed under low pressures and does not need thermal cycles. This technique has many advantages such as easy operation, high resolution, high repetition, and low cost etc. In this paper we present results of Nano Imprint Lithography using conventional Mask Aligner equipment. Polymer OG154 for UV nanoimprint lithography was studied in this paper. we present printing results of 100 nm features over a 5 cm × 5 cm area.
出处
《电子工业专用设备》
2007年第3期43-45,63,共4页
Equipment for Electronic Products Manufacturing
关键词
纳米压印
紫外
模板
Nanoimprint lithography UV Stamp
