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碱溶性光敏树脂在光致抗蚀剂中的应用 被引量:5

Application of Alkali Soluble Photosensitive Resin for Photoresist
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摘要 利用合成的碱溶性光敏树脂配制成光致抗蚀剂,对固化速率、碱溶性、涂膜表面干燥性、显影和脱膜等进行了研究。结果表明:树脂含量大于70%时,涂膜具有较好的表面干燥性、显影性和脱膜性能;光引发剂含量为5%左右,固化速率较高;50℃超声波下用3%Na2CO3显影2 m in,图象清晰度较高。 The title alkali -soluble photosensitive resin is used to prepare the photoresist. Its curing speed, alkali solubility, film drying, film developing and peelability are studied. The results indicate that when the content of resin is over 70% , the film shows better drying, developing and peelability; when the content of photoinitiators is about 5% , curing speed is higher. On the condition of 50 ℃ uhrasonie, 3 percent concentration Na2CO3 , develop 2 minutes, the definition of pictures is higher.
出处 《涂料工业》 CAS CSCD 2007年第2期26-28,32,共4页 Paint & Coatings Industry
关键词 碱溶性 UV固化材料 光致抗蚀剂 显影 光敏树脂 alkali developable UV curing material photoresist film developing photosensitive resin
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