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Polymer thin-film transistor based on a high dielectric constant gate insulator

Polymer thin-film transistor based on a high dielectric constant gate insulator
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摘要 In this paper full polymer thin-film transistors (PTFTs) based on Poly (acrylonitrile) (PAN) as the gate dielectric and poly (2-methoxy-5-(2'-ethyl-hexyloxy)-1,4-phenylene-vinylene) (MEH-PPV) as the semiconductor layer were investigated by using different channel width/length ratios. Relatively high dielectric constant of the polymer dielectric layer (6.27) can remarkably reduce the threshold voltage of the transistors to below -3V. Hole field-effect mobility of MEH-PPV of the PTFTs was about 4.8×10^-4cm^2/Vs, and on/off current ratio was larger than 10^2, which was comparable with that of transistors with widely used Poly (4-vinyl phenol) (PVP) or SiO2 as gate dielectrics. In this paper full polymer thin-film transistors (PTFTs) based on Poly (acrylonitrile) (PAN) as the gate dielectric and poly (2-methoxy-5-(2'-ethyl-hexyloxy)-1,4-phenylene-vinylene) (MEH-PPV) as the semiconductor layer were investigated by using different channel width/length ratios. Relatively high dielectric constant of the polymer dielectric layer (6.27) can remarkably reduce the threshold voltage of the transistors to below -3V. Hole field-effect mobility of MEH-PPV of the PTFTs was about 4.8×10^-4cm^2/Vs, and on/off current ratio was larger than 10^2, which was comparable with that of transistors with widely used Poly (4-vinyl phenol) (PVP) or SiO2 as gate dielectrics.
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2007年第4期1145-1149,共5页 中国物理B(英文版)
基金 Project support by the National "973" Project of China (Grant No 2002CB613405), the National Natural Science Foundation of China (Grant Nos 50573024, 50433030 and 20505020), the Key Project of Chinese Ministry of Education (Grant No 104208).
关键词 POLYMER DIELECTRIC Field effect transistor Field-effect mobility Polymer, Dielectric, Field effect transistor, Field-effect mobility
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参考文献21

  • 1Dimitrakopoulos C D, Purushothaman S, Kymissis J, Callegari A and Shaw J M 1999 Science 283 822.
  • 2Schon J H, Berg S, Kloc CH and Batlogg B 2000 Science 287 1022.
  • 3Xie Y Q, Guo J H, Peng J B, Cao Y and Wang Y 2005 Acta Phys. Sin. 54 3424 (in Chinese).
  • 4Dimitrakopoulos C D and Mascaro D J 2001 IBM J. Res.Dev. 45 11.
  • 5Bao Z, Dodabalapur A and Lovinger A J 1996 Appl. Phys.Lett. 69 4108.
  • 6Sirringhaus H, Wilson R J, Friend R H, Inbasekaran M,Wu W, Woo E P, Grell M and Bradley D D C 2000 Appl.Phys. Lett. 77 406.
  • 7Afzali A, Dimitrakopoulos C D and Breen T L J A 2002 Chem. Soc. 12 8812.
  • 8Sheraw C D L. Zhou, Huang J R, Gundlach D J, Jackson T N, Kane M G, Hill I G, Hammond M S, Campi J,Greening B K, Francl J and West J 2002 Appl. Phys. Lett.80 1088.
  • 9Crone B K, Dodabalapur A, Sarpeshkar R, Filas R W,Lin Y Y, Bao Z, O'Neill J H, Li W and Katz H E 2001 J.Appl. Phys. 89 5125.
  • 10Lin Y Y, Gundlach D J, Nelson S F and Jackson T N 1997 IEEE Electron Device Lett. 18 606.

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