TiN薄膜的应力状态对摩擦学性能的影响

Effect of Stress State in Different TiN Films on Their Tribological Performances

用Ｘ射线衍射仪测定了在５２１００钢基体上离子束增强沉积ＴｉＮ膜、等离子体化学气相沉积ＴｉＮ膜和离子镀ＴｉＮ膜的应力状态，分析了不同工艺方法制取的ＴｉＮ薄膜的应力形成的影响因素，比较了３种薄膜在不同载荷和摩擦速度条件下的摩擦学性能，分析了膜－基界面两侧应力状态对膜－基结合力、薄膜的耐磨性能和磨损机理的影响．结果表明：３种ＴｉＮ／５２１００钢试样在薄膜内的应力均为压应力，但在界面附近基体一侧的应力状态是随着工艺方法的不同而不同，３种膜的硬度和膜－基结合力都依次下降，而其内应力与膜－基应力的差值则是依次增大，分别为２６９．０ＭＰａ，６６０．５ＭＰａ和１０６３．３ＭＰａ，因而前者显示出最高的膜－基结合力和最佳的摩擦学性能；

X ray diffractometer was employed to measure the stress states of TiN films on 52100 steel substrate by ion beam enhanced deposition(IBED),plasma chemical vapor deposition(PCVD)and ion plating(IP)respectively.Analyses were carried out on the stress formation causes of the TiN films under different deposition processes.The tribological performances of the TiN films were compared at different wear conditions of load and velocity.The effect of the stress state at adjacent to the interface between TiN film and 52100 steel substrate on the adhesion strength,wear mechanisms and performances of the films was analysed.The results demonstrated that the stresses within all three kinds of the TiN films are compressive.But the microhardness of the films and film substrate adhesion decreased in the order of IBED, PCVD, IP whereas the internal stresses and the stress differences of film substrate increased in same order,which were 269.0 MPa,660.5 MPa and 1 063.3 MPa,respectively.This resulted that the former showed highest film substrate adhesion and optimum tribological performance,and the latter two showed the relatively lower film substrate adhesion and worse tribological performance.