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真空蒸馏法制备高纯碲 被引量:10

Preparation of High Purity Tellurium by Vacuum Distillation Technique
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摘要 采用真空蒸馏法提纯4N(99.99%)碲,在550℃、0.5Pa的动态真空条件下,大部分杂质从86×10-6降到7×10-6。延长冷凝段长度,蒸汽压比碲高的杂质(除Se外),即Cd、Zn和As明显减少。5N(99.999%)碲总的收率达到97%,平均蒸馏速度1.4×10-4g/(cm2.s)。 The 4N (99.99%) tellurium is purified by vacuum distillation under 550℃ and 0.5 Pa, the majority impurities were drastically reduced from 86 × 10^-6 ·to 7 × 10^-6. High vapour pressure impurities except ,Se in tellurium melt, namely Cd, Zn and As were considerably reduce in extending condensation segment. The overall yield rate of 5N(99. 999% ) tellurium was up to 97% at an average distillation rate of 1.4 × 10^-4 g/(cm^2·s).
出处 《有色金属(冶炼部分)》 CAS 北大核心 2007年第1期20-22,共3页 Nonferrous Metals(Extractive Metallurgy)
关键词 提纯 真空蒸馏 ICP—OES分析 Tellurium Purification Vacuum distillation ICP-OES analysis
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参考文献7

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