化学气相沉积SiC材料超光滑表面纳米加工

Super-smooth surface nanometer fabrication of chemical vapor deposition SiC

利用传统光学加工方法,采用陶瓷磨盘和金刚石微粉对国产化学气相沉积(CVD)SiC进行了粗磨、细磨加工;然后,利用颗粒直径从4μm到1μm的金刚石研磨膏逐级进行抛光,发现SiC表面存在纳米级划痕;最后,改用颗粒直径为20 nm氧化铝纳米颗粒的碱性水溶液进行抛光,表面粗糙度达到0.6 nm(RMS),表面纳米级划痕得到很好改善,获得了较高表面质量的超光滑表面。

Silicon Carbide （SIC） is well known as an important optical material in aerospace optical system and high power laser optics. But the optical fabrication of SiC limits its usage widely. In this paper, domestic Chemical Gas Deposition （CVD） SiC material was polished by conventional optical fabrication method, in which ceramic disk and diamond powder were used to grind and lap, and then diamond oil with grain size from 4μm to 1 μm was used to polish. After polishing nanometer scratches were found under AFM. 20 nm diameter Al3O3 alkali solution was used to continue to polish SiC surface and a surface roughness of 0. 6 nm was achieved.