摘要
采用磁控溅射法在T10钢表面获得了SiC薄膜,并研究了溅射方式、工艺参数以及中间层对薄膜结合性能的影响。试验结果表明,采用功率为200 W射频法和时间为2 h的SiC/N i-P双层薄膜结合力最好。
SiC films on T10 steel surface were prepared by magnetron sputtering method. Influence of the sputtering methods, processing parameters and interlayer on the binding force of the films were investigated. The experiment results indicate that the SiC/Ni-P films prepared by RF magnetron sputtering with power of 200 W and time of 2 h have the best binding force.
出处
《金属热处理》
EI
CAS
CSCD
北大核心
2007年第2期50-53,共4页
Heat Treatment of Metals
基金
江苏高校省级重点实验室开放课题(kjsmcx04005)
