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Trench MOSFET的研究与进展 被引量:12

Advances in the Development of Trench MOSFET
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摘要 研究总结了功率MOSFET器件与BJT器件相比的发展优势。介绍了作为VDMOSFET进一步发展的新型器件Trench MOSFET研究提出的背景及意义,并从其基本结构出发阐述了Trench MOSFET与VDMOS相比的电学性能特点。最后对其发展现状,关键技术和结构参数及其发展趋势进行了概括、总结和展望。 The advantages of power MOSFET devices over BJT were described. The background and meaning on the study of Trench MOSFET: a fresher development of VDMOS, were introduced, Based on device structures, the characteristics compared with VDMOSFET were studied. The current status and trend on the development of Trench MOSFET with the study of the key processes and structural parameters were also summarized.
出处 《半导体技术》 CAS CSCD 北大核心 2007年第4期277-280,292,共5页 Semiconductor Technology
关键词 Trench金属氧化物场效应晶体管 比导通电阻 击穿电压 元胞面积 箱型掺杂 trench MOSFET specific on-resistance breakdown voltage cell density box-shaped profile
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参考文献15

  • 1刘英坤.硅微波功率DMOSFET发展现状[J].半导体情报,1999,36(6):6-11. 被引量:5
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二级参考文献3

  • 1SHENAI K. Optimized trench MOSFET technologies for power devices [J]. IEEE Trans on Electron Devices, 1999,39(6): 1435-1443.
  • 2ONO Y, KAWAGUCHI Y, NAKAGAWA A. 30V new fine trench MOSFET with ultra low on-resistance[A].IEEE 15th Int Symup on Power Semiconductor Devices and ICs [C]. Cambridge, England,2003.28-31.
  • 3DHARMAWARDANA K, AMARATUNGA G. Modeling of high current density trench gate MOSFET[J]. IEEE Trans Electron Devices, 2000, 47(12):2420-2428.

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