期刊文献+
任意字段
题名或关键词
题名
关键词
文摘
作者
第一作者
机构
刊名
分类号
参考文献
作者简介
基金资助
栏目信息

硬质合金沉积CNx薄膜及其摩擦性能研究

〗Frition and wear property of CNx deposition on cemented carbide
下载PDF
导出
摘要 采用射频反应磁控溅射法在硬质合金(YG8)基片上沉积了CNx和CNx/TiN复合薄膜,并对其进行了后处理。XPS分析CNx薄膜的化学结构表明其中含有N-sp3C和N-sp2C两种结构。摩擦磨损实验研究表明样品具有良好的耐磨性能,样品经后处理后摩擦系数显著降低。 CNx and CNx/TiN composite films have been deposited on cemented carbide（YG8 ）by RF reaction magnetron sputtering. Analyzing by XPS indicated two types of chemical structure N-sp^3C and N-sp^2C binding states existed in the CNx films. The wear resistance of CNx films is fine. Friction coefficient of sample decrease greatly after post-treatment.
作者 刘军 唐利强 陈志刚
机构地区 江苏大学材料科学与工程学院 江苏工业学院
出处 《化工新型材料》 CAS CSCD 北大核心 2007年第3期58-60,共3页 New Chemical Materials
关键词 CNX薄膜 硬质合金 摩擦磨损 carbon nitride, cemented carbide, friction and wear
分类号 TB383.2 [一般工业技术—材料科学与工程]
  • 相关文献

参考文献10

  • 1Liu A Y,Cohen M L.Prediction of New Low Compressibility Solids[J],Science,1989,245:841-842.
  • 2Song G Y,Ping Z Y,Rong C X,et al. Carbon Nitride Films Deposited by MPCVD[J], Synthetic Crystals, 2000,29,234-239.
  • 3Kusano Y,Evetts J E,Somekh R E,et al.Properties of Carbon Nitride Fils Deposited by Magnetron Sputtering[J].Thin Solid Films,1998,332:56-61.
  • 4Yuki Togashi,Yuko Hirohata,Tomoaki Hino.Characterization of CNx Films Prepared by Reactive Magnetron Sputtering[J].Vacuum.2002,66:391-395.
  • 5Yang D Q,Sacher E.A Spectroscopic Study of CNx Formation by the keV N2+ Irradiation of Highly Oriented Pyrolytic Graphite Surfaces[J].Surface Science,2003,531:185-198.
  • 6Zhou Zhimin,Xia L F,Sun Y.The Influence of Arc Currents on the Properties of Carbon Nitride Films Deposited by Vacuum Cathodic Arc Method[J].Thin Solid Films,2002,413:26-31.
  • 7Alvarez F,Victoria N M,Hammer P.Infared Analysis of Deuterated Carbon Nitrid Films Obtained by Dual-ionbea in Assisted Deposition[J].Appl Phys Lett,1998,73:1065.
  • 8李俊杰,金曾孙,吴汉华,林景波,金哲,李哲奎,顾广瑞,盖同祥.磁控溅射非晶CN_x薄膜的热稳定性研究[J].材料科学与工艺,2004,12(1):71-74. 被引量：3
  • 9何孟兵,叶明生,范炜,彭友贵,范湘军,吴大维.新型磁控溅射法合成C_3N_4/TiN复合膜[J].材料科学与工程,1998,16(4):26-28. 被引量：3
  • 10周艳平,闫学伟,马贤峰,赵廷河.高温高压下立方氮化硼晶体的生长机制[J].无机材料学报,1995,10(4):391-398. 被引量：8

二级参考文献14

  • 1SJOTROM H,STAFSTROM S,BOMAN M.Superhard and elastic carbon thin films having fullerence—like microstructure[J].Phys Rev Lett,1995,75:1336—1339.
  • 2SCHARF T W.OTF R D.YANG D,et al.Structural and tribological characterization of protective amorphous diamond—like carbon and amorphous CN,overcoats for next generation hard disks[J].J Appl Phys,1999,85:3142—3146.
  • 3RIEDO E.COMIN F,CHEVRIER J.Composition and chemical bonding of pulsed laser deposited carbon nitride thin films[J].J Appl Phys,2000,88:4365—4369.
  • 4HELLGREN N,BROITMAN E,SERIN V.et al.Thermal stabilitv of carbon nitride thin films[J]. J Mater Res,2001,16:3188—201.
  • 5NEUHAEUSER M.HILGERS H.JOERIS P,et al.Raman spectroscopy measurements of DC-magnetron sputtered carbon nitride(a—C:N) thin films for magnetic hard disk coatings[J],Diamond Relat Mater,2000,9:1500-1505.
  • 6BAI H L.JIANG E Y.Improvement of the thermal stability of amorphous carbon films by incorporation of nitrogen[J].Thin Solid Films,1999.353:157—165.
  • 7YOSHIFUMI AOI,KOJIRO ONO.KUNIO SAKURA-DA.et al.Effect of heat treatment on structure of amorphous CN x thin films by pulsed laser deposition[J]. Thin Solid Films.2001,389:62—67.
  • 8KALISH R.LIFSHITZ Y,NUHENT K,et al.Thermal stability and relaxation in diamond—like-carbon:A Raman study of films with different sp^3 fractions(ta—C to a—C)[J].Appl phys Lett,1999,74:2936—2938.
  • 9ZHENG W T,XING K Z,HELLGREN N,et al.Nitrogen ls electron binding assignment in carbon nitride thin films with different structures[J].J Electron Spectrosc Relat Phenom,1997,87:45—49.
  • 10MEREL P,TABBAL M,CHAKER M,et al.Direct evaluation of the sp^3 content in diamond—like-carbon films by XPS[J].Appl Surf Sci,1998,136:105—1 10.

共引文献11

化工新型材料
2007年 第3期

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部