摘要
本文给出了以WF_6或WCl_6为钨源,以硅烷或氯硅烷为硅源的硅化钨气相淀积体系的热力学研究结果。结合实验,讨论了热力学结果对实验的指导和局限。
This paper presents the result of thermodynamic study on Chemical Vapor Deposition (CVD) tungsten silicide system using WF6 or WCl6 as tungsten source and silane or chloride as silicon source. The direction for experimental research and the limitation of the thermodynamic result are discussed by combining with experimental results.
出处
《电子学报》
EI
CAS
CSCD
北大核心
1989年第3期14-18,共5页
Acta Electronica Sinica
基金
上海市青年科学基金
