摘要
采用电刷镀技术在铜基体表面上制备光亮的纳米镍薄膜。通过FESEM,AFM,SEM观察,分析纳米镍薄膜的二维和三维表面形貌。利用XRD估算纳米镍薄膜的晶粒平均尺寸,探讨纳米镍薄膜沉积生长机理。
Shining nc-Ni films are prepared with the electric brush plating technology. They are observed with FESEM, AFM, SEM for analyzing the two or three dimensional surface morphologies of the ne-Ni films. The average grain size of nc-Ni films are calculated by using XRD. The deposition and growth mechanism of nc-Ni films are discussed also.
出处
《长春工业大学学报》
CAS
2007年第1期5-8,共4页
Journal of Changchun University of Technology
基金
国家重点基础研究发展规划基金资助项目(2004CB619301)
关键词
电刷镀
纳米镍
表面形貌
沉积生长机理
electric brush plating
nanocrystalline Ni（nc-Ni）
surface morphology
deposition and growth mechanism
