基于透反式二维绝对零位光栅的光刻对准技术

Lithography alignment technology based on two-dimensional zero reference grating by transmission-reflection

在二维零位光栅原理的基础上提出了一种透反式二维零位光栅系统,从理论上分析了系统的可行性,并进行了对准性能的试验.实验数据表明透反式光栅系统比一般的光刻对准技术的对比度更强,判别零位的性能更好.该系统作为一种新型的掩模-硅片对准技术,应用于光刻机中可获得优于20 nm的定位对准精度.

A two-dimensional zero reference grating by transmission-reflection based on the theory of two-dimensional zero reference grating was proposed. Its feasibility was analyzed in theory and its alignment capability was verified in experiments. The data obtained from the experiments demonstrate that the two-dimensional zero reference grating by transmission-reflection provides better contrast and distinguishing zero point capability than does the normal lithography alignment technology. As a new alignment technology between mask and silicon wafer, the technology can offer a better than 20 nm alignment precision repeat used in lithography systems.