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石墨炉原子吸收光谱法测定痕量硅的实验研究 被引量:4

Determination of Trace Silicon by Graphite Furnace Atomic Absorption Spectrometry
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摘要 本文采用光控石墨炉原子吸收技术系统地考察了普通石墨管、热解涂层石墨管及四种金属涂层管测硅的原子化行为;比较了各种石墨管的灵敏度差异及线性范围;利用光学温度控制器使测量硅的峰高信号增强一倍,试验了时间常数、载气流量、常用酸和盐对测硅灵敏度的影响;建立了饮料中硅含量测定的准确、可靠的分析方法。 Silicon absorbance which is dependented on ash and atomization temperature has been studied for uncoated and pyrolytic coated tube and also a variety of metal coating tubes. The sensitivity and linearity for different tubes have been compared. Using the optical temperature control accessory, silica peak height signal was enhanced doubly, reducing atomization time, extending useful time of graphite tube. The effect of time constant, flow rate of inert gas and a series of acids and salts have been investigated. An accurate method for the determination of trace silicon in drinks was established.
出处 《分析化学》 SCIE EI CAS CSCD 北大核心 1990年第8期741-744,共4页 Chinese Journal of Analytical Chemistry
关键词 饮料 光控石墨炉 AAS法 Optical temperature control graphite furnace atomic absorption spectrometry Driks analysis Silicon
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