AAO模板制备中高纯铝电化学抛光工艺的研究

Study on electrochemical polishing technics for high purity aluminum during preparation of AAO template

研究了高纯铝片在硫酸-磷酸-乙二醇体系中的电化学抛光工艺。确定了电化学抛光体系的配方。探讨了阳极电流密度、抛光温度、抛光时间和搅拌方式对抛光质量的影响。获得了最佳抛光工艺参数:Ja=25A/dm2,θ=85～93°C,t=10～15min,机械搅拌。新的环保型电化学抛光体系为制备优良的AAO模板奠定了基础。

A kind of electrochemical polishing technics for high pure aluminum sheet was studied in the polishing system of the sulfuric acid-phosphoric acid-glycol. Formula of electrochemical polishing system was ascertained. The influence of anode current density, polishing temperature, polishing time and stirring modes on polishing quality was discussed. The optimal technics parameters were obtained as follows： Ja = 25 A/dm^2, θ= 85 - 93 ℃, t = 10 - 15 min, mechanical stirring. The novel environmental protection polishing system lays a foundation for the preparation of an excellent AAO temolate.