摘要
本文提出了用流动注射-电感耦合等离子体发射光谱(FIA-ICP-AES)测定工艺流程Sc试液中痕量钪的新方法。考察了基体Fe和Ti的光谱干扰;对常规进样和FIA进样中的基体效应进行了比较。当采用0.5ml体积进样,以Sc 363.075nm为分析线,Sc的检出限为8.4ng/ml,R.S.D.为2.5％。此法可以直接用于基体浓度在Fe≤30mg/ml和Ti≤10mg/ml范围内痕量钪的测定,而无需分离基体或在标样和试样之间进行基体浓度匹配。本法分析速度快(90个样/小时)、操作简便和精密度好,可以作为工艺流程中测定痕量Sc的快速的分析方法。
A new method for the determination of trace Sc is described on FIA-ICP-AES. The interference effects of matrix elements Fe and Ti were investigatcd. The comparison wascarried out between conventional sample introduction and FIA sample introduction technique. The detection limit for element Sc is 8. 4 ng/ml, and relative standard deviation is 2. 5%(0. 5μg/ml of Sc, n=12). This method has been applied to determine trace Sc in technological solution without matrix match between standard solution and analyzed solution
出处
《分析化学》
SCIE
EI
CAS
CSCD
北大核心
1990年第12期1152-1153,共2页
Chinese Journal of Analytical Chemistry
关键词
ICP-AES
流动注射
钪
基体效应
Inductively coupled plasma
Flow injection analysis
Scandium
Matrix effect
