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AZO透明导电薄膜的制备技术及应用进展 被引量：29

PREPARATION AND APPLICATION OF TRANSPARENT CONDUCTIVE AZO THIN FILM
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摘要 概述了国内外AZO透明导电薄膜的多种制备技术和开发应用进展。详细介绍了磁控溅射、溶胶-凝胶、脉冲激光沉积、真空蒸镀、化学气相沉积等工艺在AZO薄膜制备中的研究现状,并且在对AZO膜与ITO膜性能比较的基础上,指出AZO薄膜的产业化前景好。 The multiform preparation technologies and applications developments on AZO thin film are described. The current research status of magnetron sputtering, sol-gel, Pulsed laser deposition, vacuum evaporating and chemical-vapor deposition techniques applied in the preparation of AZO thin film is introduced-in detail. The industrialization for AZO films in the future is more promiseful than ITO thin film.
作者 刘玉萍 陈枫 郭爱波 李斌 但敏 刘明海 胡希伟
机构地区 华中科技大学电气与电子工程学院
出处 《真空与低温》 2007年第1期1-5,20,共6页 Vacuum and Cryogenics
基金 华中科技大学校基金(No.2006M044B)资助 教育部留学归国人员科研启动基金资助(2006)
关键词 AZO薄膜 制备技术 综述 透明导电氧化物薄膜 AZO thin film preparation technology summarlze transparent conducting oxide film
分类号 TN304.21 [电子电信—物理电子学] O484 [理学—固体物理]
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参考文献33

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二级参考文献108

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共引文献163

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引证文献29

二级引证文献75

真空与低温
2007年 第1期

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