期刊文献+

Electromagnetic Wave Attenuation in Atmospheric Pressure Plasma

Electromagnetic Wave Attenuation in Atmospheric Pressure Plasma
下载PDF
导出
摘要 When an electromagnetic (EM) wave propagates in an atmospheric pressure plasma (APP) layer, its attenuation depends on the APP parameters such as the layer width, the electron density and its profile and collision frequency between electrons and neutrals. This paper proposes that a combined parameter -the product of the line average electron density n and width d of the APP layer (i.e., the total number of electrons in a unit volume along the wave propagation path) can play a more explicit and decisive role in the wave attenuation than any of the above individual parameters does. The attenuation of the EM wave via the product of n and d with various collision frequencies between electrons and neutrals is presented. When an electromagnetic (EM) wave propagates in an atmospheric pressure plasma (APP) layer, its attenuation depends on the APP parameters such as the layer width, the electron density and its profile and collision frequency between electrons and neutrals. This paper proposes that a combined parameter -the product of the line average electron density n and width d of the APP layer (i.e., the total number of electrons in a unit volume along the wave propagation path) can play a more explicit and decisive role in the wave attenuation than any of the above individual parameters does. The attenuation of the EM wave via the product of n and d with various collision frequencies between electrons and neutrals is presented.
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2007年第2期162-164,共3页 等离子体科学和技术(英文版)
基金 the National Natural Science Foundation of China(No.90405004) the Graduate Student Technology Innovation Foundation of Huazhong University of Science and Technology
关键词 cold collisional plasma electromagnetic wave electron density cold collisional plasma, electromagnetic wave, electron density
  • 相关文献

参考文献24

  • 1Vidmar R J. 1990,IEEE Trans. Plasma Sci. 18:733
  • 2Gibalov V G, Pietsch G J. 2000, J. Phys. D: Appl.Phys., 33:2618
  • 3Rutberg Ph G. 2002, Plasma Sources Sci.Technol., 11:A159
  • 4Albini F A,Jahn R G. 1961, J. Appl. Phys., 32:75
  • 5Roth J R. 1995, Industrial Plasma Engineering. Vol.1:Principles. Bristol and Philadelphia: IOP Publishing
  • 6Laroussi M,Roth J R. 1993,IEEE Trans. Plasma Sci.,21:366
  • 7Destle W W, De Grange J E, et al. 1991, J. Appl.Phys, 69:6313
  • 8Guo Bin, Wang Xiaogang. 2005, Plasma Sci. and Tech., 7:2645
  • 9Guo Bin, Wang Xiaogang. 2005, Phys. Plasmas, 12:084506
  • 10Guo Bin, Wang Xiaogang. 2006, Plasma Sci. and Tech., 8:558

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部