摘要
研究利用反应磁控溅射法在高速钢基体上制备TiAlN薄膜材料,采用XRD测试薄膜晶体结构,用UMT显微力学测试仪测试薄膜摩擦系数。在此基础上讨论铝含量、直流偏压及后期处理对薄膜摩擦系数的影响。结果表明,不同铝含量的TiAlN薄膜中都存在面心立方相和六方相,随着铝含量的增高,面心立方相比例逐渐减小,六方相增多。铝的引入使膜层的硬度明显提高。随着Al含量增加,GCr15与TiAlN膜层之间的摩擦系数下降。另外,直流偏压和后期处理亦可显著改善薄膜的抗摩擦性能。
TiAlN thin films were deposited on high speed steel substrate by reactive magnetron sputtering. The microstructure was characterized by X-ray diffractometer. Friction coefficient of the films was measured on the UMT micromechanics test system. The effect of Al content, direct current negative bias and post treatment on the friction coefficient of the films was studied. The result showed that all the films were composed of fcc structure and hcp structure. With the increase of Al content, the proportion of fcc structure decreased. The increase of the Al content also caused the enhance of hardness and the decrease of the friction coefficient between the TiAlN thin films and GCrl5 ball. The introduce of the direct current negative bias and post treatment bettered the friction resistant property observably.
出处
《航空材料学报》
EI
CAS
CSCD
2007年第2期33-36,共4页
Journal of Aeronautical Materials
基金
国家自然科学基金项目(50471091)
关键词
磁控溅射
TIALN薄膜
摩擦系数
magnetron sputtering
TiAlN thin films
friction coefficent
