改进型分布重复投影光刻机

Improved Wafer Stepper

分布重复投影光刻机(DSW)的精度和工作效率直接影响到大规模集成电路生产工艺的特殊要求。为了提高DSW的精度和效率,研究和运用了先进运动控制技术,使光刻工作台定位精度小于±0·5μm;同时应用视频网络技术,实现了远程交互式工作方式。根据要求,完成了DSW的各系统模块的设计,并且开发了基于PC的应用软件。实验结果表明,该改进型DSW体现了较高的应用价值。

The accuracy and working efficiency of wafer stepper have direct influence on the special demand of large -scale IC production. In order to improve the accuracy and the efficiency of the wafer stepper, advanced motion control technology is researched and used, which makes the position precision of the wafer stepper worktable within ± 0.5 μm. At the same time, with the technology of video and internet transportation, the long - distance interacting operation is realized. Each sub - system of wafer stepper is accomplished according to the requirement including the application software. The experiments result shows that the improved Wafer Stepper has high practical value.