HMDSO和TFM混合气体等离子体聚合膜的结构与性能

THE STRUCTURE AND PROPERTIES OF THE PLASMA POLYMERIZED FILMS OF MIXTURES OF HEXAMETHYLDISILOXANE AND TETRAFLUOROMETHANE

在钟罩式内极反应器中进行了六甲基二硅氧烷(HMDSO)和四氟化碳(TFM)混合气体等离子体聚合。用IR、XPS、X射线对聚合膜结构进行了表征。等离子体共聚合膜中含有Si和F,聚合膜中元素组成依赖于起始混合气体单体的比,Si/C元素比随着混合气体中TFM浓度增加而减小,而F/C比增大。测定了复合膜的气体透过性,等离子体共聚合方法是制备气体分离膜的可行方法。同时,还测定了等离子体聚合膜的接触角,并计算了表面能。

The plasma polymerization of mixtures of hexamethyldisiloxane(HMDSO) and tetrafluoromethane (TFM) was carried out in the bell jar type withinternal electrode. The structure of polymerized films was characterized with IR, XPS,X-ray. HMDSO/TFM were plasma-copolymerized to yield films containing both siliconand fluorine residues. The elemental composition of the formed polymer films dependedon the composition of the starting mixture. The Si/C atomic. ratio decreased with inc-reasing TFM concentration, whereas the F/C ratio increased. The gas permeability ofthese composite membrane was measured. The plasma copolymerization methods areavailable for the preparation of the membranes for gas separation. In addition, theproperties of the plasma polymerized films were studied by contact angle measurementsand surface energy count.