摘要
提出一种基于广义洛伦兹一米氏理论,在垂直于人射光方向接收散射光来检测硅中微/纳米级体缺陷的激光无损检测新途径,叙述了有关的理论基础和优越性,模拟实验证实了新途径的正确性与可行性。
A novel way which is based on Generalized Lorenz - Mie Scattering Theory and that can detect micro bulk defects in Si materials is developed. Its principle is analyzed and many advantages in it are put forward. Simulating experiments on glass sample is implemented and scattered graph collected in the direction vertical to the incident light is processed. Quite satisfactory result is achieved which dernonstrates that the noval way is correct and feasible.
出处
《应用激光》
CSCD
北大核心
1997年第2期54-56,68,共4页
Applied Laser
基金
国家自然科学基金
霍英东基金
关键词
硅材料
微米级
纳米级
体缺陷
激光
无损检测
General Lorenz & Mie scattering theory, Si material, laser, micro/nano bulk defect, non-destructive detection