摘要
为满足化学镀镍对镀液稳定性、沉积速率和镀层性能的要求,研究了化学镀Ni-P合金的多种复合稳定剂组合。对镀液稳定性、沉积速率以及镀层的孔隙率、耐蚀性和结合力进行了测试。结果表明,使用优选的复合稳定剂ZD(由不饱和有机酸、无机盐和含硫化合物复配而成),在86~88℃下,向50mL化学镀液中加入100mg/L的PdCl2溶液3mL,243s无沉淀;镀层孔隙率为0.06个/cm^2,耐浓硝酸时间为171s,镀速为18.5μm/h。结合力满足GB/T13913-92要求。该复合稳定剂协同效果好,不合重金属离子,符合环保要求。
The effects of various compound stabilizers on the stability and deposition rate of the plating bath,and the porosity,corrosion resistance,and adhesion of the electroless Ni-P alloy coatings were investigated,which was aiming at development of the combined stabilizers suitable to the electroless Ni-P plating.It was found that the compound stabilizer ZD(composed of unsaturated organic acid,inorganic salt,and S-containing compound) had good stabilizing capacity for the electroless Ni-P plating bath.Namely,50 mL of the bath solution containing 3 mL of 100 mg/L PdCl2 could remain stable up to 243 seconds at a temperature of 86~88 ℃ in the presence of the combined stabilizer.The corresponding Ni-P coating had a decreased porosity of 0.06 cm2,anticorrosion lifespan of 171 seconds in concentrated HNO3,deposition rate of about 18.5 μm/h,and adhesion to substrate meeting with the specification of GB/T 13913-92.Moreover,the compound stabilizer ZD had no heavy metal ions and showed good synergistic stabilizing capacity,while it was environmentally acceptable as well.
出处
《材料保护》
CAS
CSCD
北大核心
2007年第4期28-29,共2页
Materials Protection
关键词
化学镀NI-P合金
复合稳定剂
稳定性
孔隙率
镀速
electroless Ni-P alloy plating
compound stabilizer
bath stability
porosity
deposition rate