指数掺杂GaAs光电阴极量子效率的理论计算

Theoretical calculation of quantum yield for exponential-doping GaAs photocathodes

将GaAs光电阴极发射层掺杂浓度由体内到发射表面从高到低的进行指数掺杂,能在发射层形成一个恒定的内建电场,有利于光电子的逸出.在考虑内建电场的作用下,通过建立和求解少数载流子所遵循的一维连续性方程,得到了反射式和透射式指数掺杂阴极的量子效率公式,并利用这些公式对其量子效率进行了理论计算和仿真.计算结果显示发射层指数掺杂能较明显的提高阴极的量子效率,与均匀掺杂阴极相比,能使反射式阴极积分灵敏度提高约20%,透射式阴极提高30%以上.指数掺杂提高阴极量子效率的主要原因与内建电场有关,光电子在内建电场作用下以扩散加漂移的方式到达阴极表面,从而减小了后界面复合速率对阴极的影响,同时提高了阴极的等效电子扩散长度.

Exponential-doping photocathodes, in which from the GaAs bulk to the surface the doping concentration is distributed exponentially from high to low, can form a stable built-in electric field in the active layer, and the electric field facilitates the excited photoelectron emission. The quantum yield formulas of beth reflection-mode and transmission-mode of exponential-doped photocathodes have been solved from the 1-diemnsion continuity equations, in which the build-in electric field is considered. According to these formulas, we calculate the theoretical quantum yield of the exponential-doped photocathodes. The calculated results show that the exponential-doping structure can increase the quantum yield of photocathodes significantly. To compare with the uniformly-doped photocathodes, the integral sensitivity of the reflection-mode exponential-doped photocathodes increases by nearly 20%, and for transmission-mode photocathodes the increase is more than 30%. The performance improvements of exponential-doping photocathodes are mainly attributed to the built-in electric field, the photoelectrons driven by the field move towards the cathode surface by way of diffusion and drift, accordingly, decrease the influence of the back-interface recombination velocity on photoemission and increase the equivalent electron diffusion length of cathodes.