摘要
文章对微细加工技术中电子束曝光机的高速扫描技术进行了研究和探讨,对静电偏转和电磁偏转进行了比技.并对研制成功的电极共用式八极静电偏转器作了详细的介绍.
This paper attempted to study the high- speed scanningtechnology of microfabrication and compared electrostatic deflectionwith electromagnetic deflection,then presented the eightelectrodeelectrcatatic deflector designed by the author in detail.
出处
《电子器件》
CAS
1997年第1期694-698,共5页
Chinese Journal of Electron Devices
关键词
电子束曝光
高速扫描
静电偏转器
Electron-beam Lithography, High-speed scanning, Eight-electrode Electrostatic deflector
