YSZ/Si上溅射BSCCO高温超导薄膜的工艺参数优化

Optimization of Technic Parameters for Sputtering High Tc Superconducting BSCCO Films on YSZ/Si Substrates

本文研究了利用YSZ助作缓冲层Si(100)衬底上溅射BSCCO高温超导薄膜的生长工艺,分析了生长条件(主要是生长温度)对BSCCO高温超导相的影响,并提出了YSZ/Si上制备(2212)相BSCCO膜的工艺参数.

In this peper. the grwwing technic for sputtering high Tc superconducting BSCCO films on YSZ/Si substrates is studied,the effects of deposition conditions (especially the growth temperatuns)on the high Tc superconducting phases transition are analyzed,and the technic parameters for fabricating Bi- (2212) on YSZ/Si are presented.