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磁控溅射参数对CN_x薄膜成分、化学结合状态和硬度的影响 被引量：4

The Effects of Experimental Parameters during Magntron Sputter Deposited CN x on Film Composition,Chemical Bonding and Hardness
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摘要 应用直流非平衡磁控溅射系统在不同实验条件下制备了ＣＮｘ薄膜材料，其最大氮原子百分含量为３７％。通过傅里叶变换红外光谱、Ｘ光光电子能谱以及显微压痕法的测量和分析，对得到的ＣＮｘ薄膜材料中的原子化学结合状态、硬度等性质进行了表征。 CN X thin films were grown using dc unbalanced magnetron sputtering at different experimental conditions.,The maximum of nitrogen concentration in our CN x films is 37 at%.From the measurements and analyses of FTIR. XPS,and manoindentation,the characterization of CN x films has been performed
作者 郑伟涛 丁涛 李海波 陈岗 王煜明
机构地区 吉林大学材料科学系
出处 《材料科学与工艺》 EI CAS CSCD 1997年第1期8-11,共4页 Materials Science and Technology
关键词 CNX 薄膜 生长 表征 CN X thim Films, Growth, Characterization
分类号 TB43 [一般工业技术] O484.4 [理学—固体物理]
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  • 1Fujimoto F,Ogata K. Formation of Carbon Nitride Firm by Means of Ion Assisted Dynamic Mixiny Method. Jpn,J.Ahys,1993,32(3B):420～424
  • 2LI D, CHU X, CHENG S et al. Synthesis of Superhard Carbon Nitride Composite Coatings. Appl.Phys,Tett.,1995,67(2),203～205
  • 3Tharigen T, Lippold G, Riede V et al. Hard Amorphous CSixNy Thin Films Deposited by RF Nitrogen Plasma Assisted Pulsed Laser Ablation of Mixed Graphite/Si3N4-targets.Thin Solid Films,1999,348:103～106
  • 4FENG J, LONG C, ZHENG Y et al. Crgst.Growth,1995:147(3-4):333-338
  • 5LIU A Y, Coben M L. Structural Properties and Electronic Structure of Low-compressibility Materecials:β-Si3N44 and Hypothetical β-C3N4,Phys Rev .B.,1990,41(15):10727～10731
  • 6Teter D M, Hemler R J. Low-Compcessibility Carbon Nitrides. Science,1996,271:53～55
  • 7Therasse M,Benlahsen M. Effects of deposition temperature on the structure of amorphous carbon nitride films. Solid State Commun,2004,129:139.
  • 8Akiyama M,Alexandrou I, Chhowalla M, et al. Optimizing hardness of CNX thin films by dc magnetron sputtering and a statistical approach. J Mater Sci,2001, (36) :5397.
  • 9Gammon W J, Kraft O, Reilly A C, et al. Experimental comparison of N( 1 s) X-ray photoelectron spectroscopy binding energies of hard and elastic amorphous carbon nitride films with reference organic compounds. Carbon,2003,41:1917.
  • 10Bertran E, Pino F J, Virea G, et al. Hard coatings for mechanical applications. Vacuum,2002,64:181.

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材料科学与工艺
1997年 第1期

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