一种新颖的光罩可制造性规则检查方法与系统

Novel Photomask Manufacturing Rule Check Method and System

介绍了一种较为先进的光罩可制造性规则检查的方法及其系统构成。实验结果表明,通过整合各种EDA工具,在光罩检验前就可发现这些可能给光罩检验造成困难的图形,为后续光罩检验步骤提供参考,显著提高了光罩检验的效率。

A novel method and system for photomask manufacturing rule check （MRC） were introduced. The experimental results show the small figures, which may cause inspection failure, can be found with the method of integration of EDA tools. The MRC results provide reference for photomask inspection to improve the efficiency of mask inspection tools.