溅射功率对TiO_2薄膜结构与特性的影响

Influence of Sputtering Power on Microstructures of TiO_2 Films

采用射频磁控溅射法,在室温和不同功率条件下,在soda-lime玻璃衬底上成功制备出TiO2薄膜。运用X射线衍射(XRD)仪、能谱仪、拉曼(Raman)光谱仪、PL光谱、紫外—可见(UV-VIS)分光光度计等对样品进行了表征分析。分析结果表明:当溅射功率小于100 W时,在soda-lime玻璃衬底上制备的TiO2薄膜为无定形结构。当溅射功率大于等于150 W时,所得TiO2薄膜中出现锐钛矿结构。在本实验中,随溅射功率的增加,TiO2薄膜的结晶越好,晶粒的粒径不断增大且沿(101)取向生长。当在氧气气氛中500℃退火2 h后,制备的TiO2薄膜中锐钛矿相晶粒尺寸增加了17%。在本实验条件下,随着溅射功率的增加,薄膜厚度明显增加,薄膜厚度与溅射功率基本成线性关系。通过光催化降解实验得出,所得到的纳米TiO2薄膜对亚甲基兰溶液具有较强的降解能力。

Microstructures and properties of TiO2 films, grown by magnetron sputtering on soda-lime glass substrates, were characterized with X-ray diffraction（XRD）, X-ray energy dispersive spectroscopy（EDS）, Raman spectroscopy, photoluminescence spectroscopy（PL）and ultra- violet visible（ UV-Vis） transmission spectroscopy. The results show that the sputtering power significantly affects the microstructures and deposition rate of the films.For instance,at a sputtering power lower than 100 W,the film is amorphous,whereas at a power higher than 150 W,the film has an anatase phase. As the power increases, the deposition rate linearly increases, the crystallinity improves, and the grains grow with （101） preferential growth orientation.After annealing in O2 at 500 ℃ for 2 hours,its anatase-phased grain size increases by 17% and the film displays good photo-catalytic abihty in degradation of methyl blue solution.