三甲基硅基取代聚硅烷的合成与性能研究

SYNTHESIS AND CHARACTERIZATION OF TRIMETHYLSILYL-SUBSTITUTED POLYSILANE

利用聚甲基硅烷(PMS)的高分子反应合成三甲基硅基取代聚硅烷(SPS),研究其分子组成与结构,热分解性能和导电性能等.FT-IR、1H-NMR、29Si-NMR、UV和GPC分析表明,SPS具有Si—Si相连的主链结构,侧链的部分取代基中含有三甲基硅侧基.SPS可溶于一般常见的有机溶剂,其热分解特性表明,陶瓷产率为44%,可用作SiC陶瓷先驱体.通过热交联反应可以有效提高其分子量,将其与碘掺杂,电导率为10-6S/cm量级,在半导体范围.

A new class of polysilane polymers containing pendant silyl substituents, named trimethylsilyl-substituted polysilane （SPS）, was prepared by polymer reaction of polymethylsilane and characterized by means of FT-IR, ^1H- NMR,^29Si CP MAS-NMR, UV and GPC, respectively. This polymer is soluble in common organic solvents, and its molecular weight can be increased by crosslinking reaction. The property of pyrolysis shows that its ceramic yield is 44%, and it is a potential preceramic polymer.The conductivity of SPS can be as high as 10^-6 S/cm in the range of semi-conductor after being doped with iodine due to the possibly wider δ-delocalized system caused by the silicon substituents.