衬底温度对磁控溅射法制备ZnO薄膜结构及光学特性的影响

Effect of the substrate temperature on the structural and optical properties of ZnO films deposited by reactive magnetron sputtering

采用射频反应磁控溅射法在玻璃衬底上制备了具有c轴高择优取向的ZnO薄膜,利用X射线衍射仪、扫描探针显微镜及紫外分光光度计研究了生长温度对ZnO薄膜的结构及光学吸收和透射特性的影响。结果表明,合适的衬底温度有利于提高ZnO薄膜的结晶质量;薄膜在紫外区显示出较强的光吸收,在可见光区的平均透过率达到90%以上,且随着衬底温度的升高,薄膜的光学带隙减小、吸收边红移。采用量子限域模型对薄膜的光学带隙作了相应的理论计算,计算结果与实验值符合得较好。

ZnO films with c-axis preferred orientation were prepared on glass substrates by RF magnetron sputtering at variant temperatures,effect of the substrate temperature on the structural and optical properties of ZnO thin films was studied by X-ray diffraetometry （XRD）, SPM and UV speetrophotometer. The results showed that the crystallization of the films were promoted by desirable substrate temperature; the films possessed a transmittance of about 90% in the visible region and a sharp optical absorption in the UV region;Furthermore, the band gap decreased and the absorption edges of the samples exhibited the red shift with the temperature increased. The theoretical calculations have been carried out with the quantum confinement model,and the calculated values were in good agreement with the experimental values.