摘要
讨论了ITO膜的湿法蚀刻特性，得出了有关蚀刻速率的定量关系；比较了ITO膜的不同配比的蚀刻没，并指出了加热至50℃～60℃的、体积比为50∶（3～9）∶50的HCl和HNO_3与水混合液比较适合于大规模生产需要。
The wet etching properties of Indium Tin Oxide films are disscussed in this paper. The relationship between the Etching rate and the temperature is studied. Some different composition of etchants of ITO films are compared. It was found that the HCl∶ HNO_3∶ H_2O with volume ration of 50∶ (3-9)∶50 heated to 5O℃-60℃ are very ideal etchants for the wide production usage.
出处
《激光与红外》
CAS
CSCD
北大核心
1997年第1期48-50,共3页
Laser & Infrared
关键词
ITO膜
蚀刻
膜层
ITO films, Etch, film thickness
