摘要
在等离子体加工过程中产生的尘埃微粒是影响半导体集成电路生产质量的关键问题，近年来吸引了不少科学家的注意力．尘埃等离子体已成为等离子体物理中一个重要的前沿分支．本文综述低气压等离子体加工过程中关于尘埃微粒的形成及生长过程、带电机制、作用力、输运特性及尘埃等离子体的强耦合性质等方面的研究进展，并介绍其主要测量手段。
Dust particles generated in processing plasmas are a key factor affecting quality in semi-conductor production, so that many scientists pay a great deal of attention to it in recent years. Dusty plasma research becomes an important front branch in plasma physics.This paper gives a review of the research progress on particle behaviors in processing plasmas, including particle nucleation, growth, trapping,charging, forces on particles, transport and strong couple characteristics. The major measurement methods, observation results and theoretical models are discussed.
出处
《力学进展》
EI
CSCD
北大核心
1997年第1期56-69,共14页
Advances in Mechanics
