石墨在高纯氦中的高温氧化研究

INVESTIGATION OF THE OXIDATION OF GRAPHITE IN HIGH PURITY HELIUM ATMOSPHERE

研究了石墨在高纯氦中的氧化动力学行为。氧化后的样品用扫描电子显微镜进行分析，对可能的氧化机制进行了讨论。实验结果表明：高纯度、高强度、高密度石墨，即“三高”石墨在８００℃高纯氦中的氧化速率最低，等静压石墨次之。

High temperature oxidation behaviors of three kinds of graphite are investigated in high purity He atmosphere.The oxidized samples are analysed using scanning electron microscope (SEM) .Possible oxidation mechanisms are discussed.The experimental results show that the oxidation rate of “three high” graphite is less than isostatic pressing graphite which is less than 010 graphite in high purity helium.