期刊文献+

非离子型产酸剂——N-羟基邻苯二甲酰亚胺对甲苯磺酸酯的合成与性能研究 被引量:3

Synthesis and Characterization of the Non-Ionic Photoacid Generator-Phthalimidotosylate
下载PDF
导出
摘要 以邻苯二甲酸酐、盐酸羟胺和对甲苯磺酰氯为起始原料,合成了非离子型光致产酸剂——N-羟基邻苯二甲酰亚胺对甲苯磺酸酯,对其进行了红外、核磁共振和紫外表征,测定了其化学结构、溶解性和紫外吸收等性能.结果表明,这种非离子型产酸剂较离子型产酸剂在常用溶剂中有非常良好的溶解性,并在248 nm处有好的透明性,可用于深紫外光刻工艺体系. Phthalimidotosylate (PIT) was synthesized from o-phthalic anhydride, hydroxylamine hydrochloride and p-toluenesulfonyl chloride. It was characterized with FTIR and 1H NMR. Experiments showed that PIT has good transparence in 248 nm wavelength ( absorbance = 0. 375 ) and good solubility in organic solvents. So it is a good potential photoacid generator (PAG) in the deep- UV 248 nm photoresist system.
出处 《感光科学与光化学》 EI CAS CSCD 2007年第3期198-203,共6页 Photographic Science and Photochemistry
关键词 产酸剂 光致抗蚀剂 N-羟基邻苯二甲酰亚胺对甲苯磺酸酯 photoacid generator photoresist phthalimidotosylate
  • 相关文献

参考文献17

  • 1郑金红,黄志齐,文武.ULSI用193nm光刻胶的研究进展[J].精细化工,2005,22(5):348-353. 被引量:9
  • 2刘明大,李淑文,史素姣.0.4μm条宽的光刻[J].半导体光电,1994,15(4):336-339. 被引量:10
  • 3杨凌露,张改莲,余尚先.化学增幅抗蚀剂用光产酸源[J].化学通报,2003,66(7):474-478. 被引量:12
  • 4Schwartzkopf G,Niazy N N,Das S,et al.Onium salt structure/property relationships in poly(4-tert-butyloxycar-bonyloxystyrene) deep UV resist[J].Proc.SPIE,1991,1466:26-38.
  • 5Yamato H,Asakura T,Hintermann T,Ohwa M.Novel non-ionic photoacid generator releasing strong acid for chemically amplified resists[J].Proc.SPIE,2004,5376:103-114.
  • 6Yamato H,Asakura T,Matsnmoto A,Ohwa M.Novel photoacid generators for chemically amplified resists[J].Proc.SPIE,2002,4690:799-808.
  • 7Asakura T,Yamato H,Matsumoto A,et al.A novel photoacid generator for chemically amplified resists with ArF exposure[J].Proc.SPIE,2003,5039:1155-1163.
  • 8Wang L Y,Wang W J,Guo X.The synthesis and properties of N-hydroxy maleopimarimide sulfonate derivatives as PAG and inhibitor for deep UV photoresist[J].Proc.SPIE,2004,5376:608-615.
  • 9朱冰春,王宇光,曹东华,陈银飞.N-羟基邻苯二甲酰亚胺的合成与应用[J].浙江化工,2004,35(4):5-6. 被引量:8
  • 10Shigehisa H,Hiroshi S.Preparation of N-hydroxyphthalimide[P].JP,200247270.2002-01-12.

二级参考文献65

  • 1浦野文良 中畑正明 等.[P].JP:10213899.1991.
  • 2Cheruthur G. US 5 493 031[P] ,1996.
  • 3Vermeulen N M J,O'Day C L,Webb H K, et al. US 6 172 261[P] ,2001.
  • 4Harris J M. US 6 432 397[P] ,2002.
  • 5Harris J M. US Pat Puc No. 20 020 150 548[P].
  • 6Nskai T,Asada T. US 6 350 836,2002.
  • 7Wuensch E. Chem Ber[J] ,1966,99:110.
  • 8Hoppe-Seyler's Z. Physiol Chem[J] ,1966,346(2) :301.
  • 9Govindan C. US 5 426 190[P] ,1995.
  • 10T Ohfuji, M Takahashi, M Sasago et al. J. Photopolym. Sci. Technol. ,1997,10(4):551-558.

共引文献34

同被引文献22

  • 1梁舰,李建章,周波,秦圣英.N-羟基邻苯二甲酰亚胺(NHPI)用于有机氧化反应的研究进展[J].化学研究与应用,2004,16(5):597-600. 被引量:8
  • 2王健,王文广,张伟民,蒲嘉陵.三嗪类化合物的合成及其产酸性能研究[J].感光科学与光化学,2006,24(6):436-443. 被引量:10
  • 3Sawatari N,Yokota T,Sakaguchi S,et al.Alkane Oxidation with Air Catalyzed by Lipophilic N-Hydroxyphthalimides without Any Solvent[J].J.Org.Chem.,2001,66(23):7889-7891.
  • 4Saha B,Koshino N,Espenson J.N-Hydroxyphthalimides and Metal Cocatalysts for the Autoxidation of p-Xylene to Terephthalic Acid[J].J.Phys.Chem.A,2004,108(3):425-431.
  • 5Zhu BC,Wang Y G,Cao D H,et al.Sythesis and application of N-hydroxyphthalimide[J].Zhe Jiang Chemistry,2004,35 (4):526.
  • 6Ludwig Bauer,Stanley V,Miarka.The Chemistry of N-Hydroxyphthalimide[J].J.Am.Chem.Soc.,1957,79:1983-1985.
  • 7Wang L Y,Wang W J,Guo X.The synthesis and prQperties of N-hydroxy maleopimarimide sulfonate derivatives as PAG and inhibitor for deep UV photoresist[J].Proc.S PI E,2004,5376:6082615.
  • 8Shigehisa H,Hiroshi S.Preparation of N-hydroxyphthalimide:JP,200247270[P].2002-01-12.
  • 9姜麟忠.氨氧基脂肪羧酸的合成方法[P].CN1051170.1991.05.08.
  • 10付时雨 余惠生 詹怀宇.N-羟基邻苯二甲酰亚胺的合成方法[P].CN1239715A.1999-12-29.

引证文献3

二级引证文献5

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部