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中频反应磁控溅射Al_2O_3薄膜的光学性质 被引量：10

Optical Properties of Al_2O_3 Thin Film Prepared Through Medium-Frequency Reactive Magnetron Sputtering Process
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摘要 采用中频反应磁控溅射技术在玻璃基片上制备了Al2O3薄膜,提出了一种利用透射光谱来简单有效地分析弱吸收薄膜的光学特性及与光学相关的其他物理特性的方法.对Al2O3薄膜进行透射谱测量,通过对薄膜折射率、吸收系数、膜厚度与入射光波长相互关系的分析,获得了Al2O3薄膜在400-1100 nm区域内的折射率、吸收系数与入射光波长的关系式,以及Al2O3薄膜厚度的计算公式. Aluminum oxide thin films were deposited through the medium-frequency reactive magnetron sputtering process. An effective and simple way was therefore developed to analyze the optical properties of low-absorbability films and other relevant physical properties by use of transmittance spectroscopy for Al2O3 film samples. The dependences of refractive index and extinction coefficient on wavelength were calculated in this way. The interrelation between incident light wavelength, refractivity, absorptance and film thickness of Al2O3 films is discussed, thus giving the relationship between the refractivity, absorptance and incident light wavelength in the range of 400-1 000 nm, as well as the formula of Al2O3 film thickness.
作者 廖国进 闻立时 巴德纯 刘斯明
机构地区 东北大学机械工程与自动化学院 中国科学院金属研究所表面工程部 北京航空航天大学机械工程与自动化学院
出处 《东北大学学报（自然科学版）》 EI CAS CSCD 北大核心 2007年第5期687-691,共5页 Journal of Northeastern University(Natural Science)
基金 国家自然科学基金资助项目(50376067)
关键词 AL2O3薄膜 光学性质 折射率 吸收系数 膜厚度 Al2O3 thin film optical property refractivity absorptance film thickness
分类号 O484.4 [理学—固体物理]
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参考文献18

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共引文献132

同被引文献91

引证文献10

二级引证文献25

东北大学学报（自然科学版）
2007年 第5期

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