摘要
论述超临界流体清洗技术的研究现状和应用前景,结合现有的研究成果介绍超临界CO2清洗技术在微电子(MEMS)、半导体清洗、金属氧化物污染材料清洗、复杂零件清洗等方面的可行性和有效性,并对超临界CO2清洗工艺作了简要介绍。分析了当前清洗方法的问题和不足,指出了在这一领域今后进一步研究和开发急需解决的关键技术难题及可行性的解决方案。
In this article, the research status and application foreground of supercritical fluid cleaning （SCFC） technology was demonstrated. According to the study results in being, the feasibility and validity of SCFC was analyzed in the fields of MEMS, semiconductors, metal oxidation contaminants, and complex elements and so on. The SCFC technology with CO2 was simply described. Main problems and shortages for cleaning methods existed were compared. Finally, key technologies and available projects for SCFC development were also presented.
出处
《清洗世界》
CAS
2007年第5期34-41,共8页
Cleaning World
关键词
超临界流体清洗
微电子
半导体
金属氧化物
复杂零件
清洗工艺
supercritical fluid cleaning
micro - electronics
semiconductor
metal oxidation
complex elements
cleaning methods
